Patent · US Active

Method of producing a PVD layer and a coated cutting tool

US10837100B2 · kind B2 · utility

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1References
15Claims
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Key dates

Filing dateDec 20, 2016
Grant dateNov 17, 2020
Priority date
Expiry dateDec 24, 2036

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C30/005
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method for producing a coating on a substrate, wherein the coating includes a PVD layer (A), deposited by cathodic arc evaporation, being a compound of the formula MexSiyAlzCaNbOc, wherein Me is one or more metals of groups 4, 5 and 6 in the IUPAC periodic table of elements. The PVD layer (A) is deposited by applying a pulsed bias voltage of from about −40 to about −450 V to the substrate and using a duty cycle of less than about 12% and a pulsed bias frequency of less than about 10 kHz. A coated cutting tool having a substrate and a coating is also disclosed, wherein the coating includes the PVD layer (A) with the compound of the formula MexSiyAlzCaNbOc. The PVD layer (A) is crystalline having a FWHM (Full Width at Half Maximum) value for the cubic (111) peak in X-ray diffraction of ≤0.3 degrees (2theta).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.