Method of producing a PVD layer and a coated cutting tool
US10837100B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2016 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Dec 24, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C30/005
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for producing a coating on a substrate, wherein the coating includes a PVD layer (A), deposited by cathodic arc evaporation, being a compound of the formula MexSiyAlzCaNbOc, wherein Me is one or more metals of groups 4, 5 and 6 in the IUPAC periodic table of elements. The PVD layer (A) is deposited by applying a pulsed bias voltage of from about −40 to about −450 V to the substrate and using a duty cycle of less than about 12% and a pulsed bias frequency of less than about 10 kHz. A coated cutting tool having a substrate and a coating is also disclosed, wherein the coating includes the PVD layer (A) with the compound of the formula MexSiyAlzCaNbOc. The PVD layer (A) is crystalline having a FWHM (Full Width at Half Maximum) value for the cubic (111) peak in X-ray diffraction of ≤0.3 degrees (2theta).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.