Multilayer barrier and method of formation
US10837105B1 · kind B1 · utility
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20Claims
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Key dates
| Filing date | Jan 3, 2019 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Jan 3, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/3912
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A multi-layer barrier and method of formation. The method includes applying oxidation to a top of a reference layer, and depositing a plurality of different metal layers over the reference layer. The method also includes providing different oxidation doses at different temperatures to different layers of the plurality of metal layers. The method further includes performing an annealing operation after depositing at least two of the plurality of different metal layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.