Patent · US Active

Pressure measuring system

US10837855B2 · kind B2 · utility

0Cited by

9References

21Claims

0Family size

Assignee

Endress+Hauser SE+Co. KG · DE

Inventors

Daniel Sixtensson · Potsdam, DE
Fred Haker · Kleinmachnow, DE
Dennis Müller · Ketzin/Havel, DE
Andreas Guth · Stahnsdorf, DE
Rene Ziermann · Kleinmachnow, DE

Key dates

Filing date	Sep 12, 2016
Grant date	Nov 17, 2020
Priority date	—
Expiry date	Jun 26, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG01L19/04
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Disclosed is an easily manufacturable pressure measuring system comprising a support, especially a support of metal, especially stainless steel, a pedestal connected with the support, and a pressure sensor mounted on a free end of the pedestal, in the case of which the pressure sensor is protected against thermomechanical stresses. The pressure measuring system is distinguished by features including that the pedestal includes a base arranged on the support, the pedestal includes a projection extending from the base toward the pressure sensor and comprising the free end of the pedestal, the base has a footprint, which is larger than a footprint of the projection, and the projection has a footprint, which is smaller than a footprint of the pressure sensor mounted thereon.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.