Method for manufacturing a waveguide for guiding an electro-magnetic wave
US10838148B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 4, 2019 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Dec 4, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12173
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing of a waveguide for guiding an electro-magnetic wave comprising: forming a first waveguide layer, a sacrificial layer and a protection layer on a first wafer, patterning to define a pattern of a first waveguide part and a supporting structure in the first waveguide layer; exposing the sacrificial layer on the first waveguide part while the protection layer still covers the sacrificial layer on the supporting structure; removing the sacrificial layer on the first waveguide part; removing the protection layer; bonding a second wafer to the sacrificial layer of the first wafer such that a second waveguide part is supported by the supporting structure and a gap corresponding to the thickness of the sacrificial layer is formed between the first and second waveguide parts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.