Salt and photoresist composition containing the same
US10838300B2 · kind B2 · utility
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4Claims
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Key dates
| Filing date | Sep 1, 2017 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Sep 1, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A− represents an organic anion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.