Integrated circuit (IC) portholes and related techniques
US10839109B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2019 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Oct 9, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S707/952
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An integrated circuit (IC) structure includes a device layer including a security-critical wire and a metal layer disposed over the device layer. The metal layer includes at least one wire and an IC porthole. The IC porthole has a perimeter that defines a shape such that, when the perimeter of the IC porthole is projected onto the device layer, the projection of the IC porthole perimeter includes at least a segment of the security-critical wire, and the at least one wire in the metal layer does not overlap the security-critical wire within the projection of the IC porthole perimeter to thereby allow post-fabrication optical inspection of the security-critical wire through the IC porthole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.