System and method for correcting laser beam wavefront of high power laser systems
US10840667B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 29, 2018 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Nov 29, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and a system for laser pulse wavefront correction and focusing optimization for laser Wakefield interaction to accelerate electrons to high energy, and more generally for laser matter interaction where both far field and intermediate field optimization are important, allowing a robust wavefront correction and focusing optimization with a high-power laser system at its nominal laser pulse energy and laser pulse duration. The method comprises, after laser beam focusing by focusing optics, coupling an imaging unit to a wavefront sensor, thereby measuring the laser beam wavefront, and adjusting the measured laser beam wavefront to converge to a reference wavefront of the imaging unit using a spatial phase-modifying device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.