Patent · US Active

Plasma deposition method for catechol/quinone functionalised layers

US10843224B2 · kind B2 · utility

0Cited by

3References

9Claims

0Family size

Assignee

Luxembourg Institute of Science & Technology (LIST) · LU

Inventors

Christophe Detrembleur · Liège, BE
Cecile Vandeweerdt · Liège, BE
Christelle Vreuls · Blegny, BE
Rodolphe Mauchauffe · Russange, FR
Maryline Moreno-Couranjou · Russange, FR
Nicolas Boscher · Audun-le-Tiche, FR
Patrick Choquet · Montigny-lès-Metz, FR

Key dates

Filing date	Aug 24, 2015
Grant date	Nov 24, 2020
Priority date	—
Expiry date	Jul 10, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC09D133/26
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

A solvent-free plasma method for depositing an adherent catechol and/or quinone functionalised layer to an inorganic or organic substrate from a precursor which comprises at least a quinone group; a protected or unprotected catechol group; a molecule substituted by a quinone group and/or a protected or unprotected catechol group; and/or a natural or synthetic derivative of a catechol group and/or a quinone group; wherein the quinone group is a 1,2-benzoquinone group and the catechol group is a 1,-dihydroxybenzene group.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.