Measuring apparatus and method for measuring film thickness using relative heights in combination with refractive index
US10845185B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 28, 2017 |
| Grant date | Nov 24, 2020 |
| Priority date | — |
| Expiry date | Nov 28, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/45
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
There is provided a method of measuring a film thickness of a transparent material on a substrate. A first object (transparent material) is applied onto a first substrate surface, and a second object (transparent material) is applied onto a second substrate surface. The method includes: measuring a first relative height of a front surface of the first object with respect to the first substrate surface at a position without the first object; measuring a second relative height of the front surface with respect to a back surface of the first object; and calculating a refractive index of the transparent material, based on the first relative height and the second relative height. The method includes measuring a film thickness of the second object, using a third relative height of a front surface of the second object with respect to a back surface of the second object and the calculated refractive index.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.