Mass flow controller, apparatus for manufacturing semiconductor device, and method for maintenance thereof
US10845232B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 20, 2018 |
| Grant date | Nov 24, 2020 |
| Priority date | — |
| Expiry date | Apr 12, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F15/04
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are mass flow controllers, apparatuses for manufacturing semiconductor devices, and methods of maintenance thereof. The mass flow controller may control an amount of a gas provided into a chamber. The mass flow controller may be configured to obtain an absolute volume of the gas provided into the chamber at a standard flow rate when the mass flow controller is initially used. The mass flow controller may be configured to obtain a detected flow rate of the gas provided at a measured flow rate after the mass flow controller has been used for a predetermined time. The mass flow controller may be configured to compare the detected flow rate and the standard flow rate to verify a full-scale error in the measured flow rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.