Optical devices with patterned anisotropy incorporating parallax optic

US10845520B2 · kind B2 · utility

Assignee

• ROLIC AG · CH

Inventors

• Klaus Schmitt · Lörrach, DE
• Hubert Seiberle · Lörrach, DE
• David Pires · North Vancouver, CA

Key dates

• Filing date: Mar 30, 2015
• Grant date: Nov 24, 2020
• Expiry date: Nov 25, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B30/30
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention provides a method for generation of an orientation pattern in a photo-alignable material using parallax optic. The invention further provides optical devices comprising a parallax optical element and an element with patterned optical anisotropic properties. Such devices have angular dependent, optically anisotropic properties, which are useful for various applications.