Optical elements and method for fabricating the same
US10850462B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 3, 2018 |
| Grant date | Dec 1, 2020 |
| Priority date | — |
| Expiry date | Mar 2, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/231
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method for fabricating an optical element is provided. A substrate is provided. A plurality of metal grids are formed on the substrate. An organic layer is formed on the substrate and the metal grids. The organic layer is etched to form a first patterned organic layer including a plurality of first protrusion portions and a plurality of first trenches surrounded by the first protrusion portions. The first patterned organic layer is etched to form a second patterned organic layer including a plurality of second protrusion portions and a plurality of second trenches surrounded by the second protrusion portions. Each second protrusion portion covers one metal grid. There is a distance between the center axis of one second protrusion portion of the second patterned organic layer and the center axis of one metal grid covered by the one second protrusion portion of the second patterned organic layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.