Methods for evaporating and depositing high vapor pressure materials
US10851452B2 · kind B2 · utility
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13Claims
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Inventors
Key dates
| Filing date | Sep 14, 2017 |
| Grant date | Dec 1, 2020 |
| Priority date | — |
| Expiry date | Apr 15, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is disclosed, which can comprise via a transonic gas jet, depositing a thin film of LiPON on a substrate via a directed vapor deposition process. The transonic gas jet transports a thermally evaporated vapor cloud comprising the LiPON, wherein, the transonic gas jet comprises one of (a) substantially entirely nitrogen (N2) gas; or (b) nitrogen (N2) gas as a dopant in a concentration greater than 10% by volume in an inert carrier gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.