Heating and hot water supply apparatus
US10852036B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2018 |
| Grant date | Dec 1, 2020 |
| Priority date | — |
| Expiry date | May 10, 2039 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF24D2220/0271
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A distribution valve controls a distribution ratio of a heat transfer medium between a hot water supply path including a heat exchanger for hot water supply and a beating circulation path through which the heat transfer medium is supplied to a heating terminal. A bypass flow rate control valve controls a bypass ratio which is a ratio of a flow rate of low temperature water introduced into a bypass pipe that bypasses the heat exchanger for hot water supply to a flow rate of low temperature water introduced into a water inlet pipe. The bypass ratio is regulated so that a hot water temperature detected by a temperature sensor reaches a hot water target temperature. During a simultaneous operation of hot water supply and heating, the distribution valve is controlled so that, when a bypass ratio is low, a distribution ratio is higher than when a bypass ratio is high.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.