Pattern structure inspection device and inspection method
US10852246B2 · kind B2 · utility
2Cited by
2References
6Claims
0Family size
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Key dates
| Filing date | Jun 1, 2017 |
| Grant date | Dec 1, 2020 |
| Priority date | — |
| Expiry date | Aug 17, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0668
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
According to an aspect of the present invention, there is provided a pattern structure inspection method including irradiating a wave from a wave source onto a sample including a pattern region in which a structure having a certain pattern is provided on a substrate, collecting speckle data generated due to multiple scattering of the wave in the pattern region, by using a data collector, and analyzing whether the structure of the pattern region has a defect, by comparing the collected speckle data to reference speckle data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.