Patent · US Active

Method for structuring a substrate surface

US10857622B2 · kind B2 · utility

0Cited by

3References

12Claims

0Family size

Assignee

Forschungszentrum Jülich GmbH · DE

Inventors

Caren Gatzen · Aachen, DE
Daniel Emil Mack · Lehrte, DE
Martin Tandler · Viersen, DE
Robert Vassen · Herzogenrath, DE

Key dates

Filing date	Jun 13, 2018
Grant date	Dec 8, 2020
Priority date	—
Expiry date	Jun 13, 2038

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB23K2103/16
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A method for generating a structured surface on a substrate includes analyzing a substrate surface of the substrate and selecting, as a function of a condition of the substrate surface, method parameters including focus diameter, pulse peak power, pulse energy, point spacing, pulse length, pulse spacing and/or pulse sequence. The method further includes generating, by partial ablation and partial deposition via treatment with an intensive pulsed laser beam, surface structures having dimensions in the sub-micrometer range such that a multi-scale surface structure in the sub-micrometer and micrometer range adapted to intrinsically inhomogeneous properties of the substrate surface in the sub-micrometer range is generated. The substrate is an inhomogeneous substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.