Enhancement or suppression of electro-magnetic attributes via second laser
US10859503B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Dec 17, 2018 |
| Grant date | Dec 8, 2020 |
| Priority date | — |
| Expiry date | Apr 15, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2316
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The system and method for enhancing and suppressing radio frequency (RF) emissions in a laser induced plasma system using a second laser. A first igniter laser is used at short pulse widths and a second heater laser is used at longer pulse widths. By varying the energy of the heater laser and/or the timing of the arrival of the heater laser with respect to the igniter laser suppression and/or enhancement of the radio frequency (RF) emission from the induced plasma system is possible.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.