Systems and methods of aberration correction in optical systems
US10859739B2 · kind B2 · utility
3Cited by
2References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 2, 2019 |
| Grant date | Dec 8, 2020 |
| Priority date | — |
| Expiry date | Jun 2, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/3592
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Described herein is a diffraction grating (1) for use in an optical system. The diffraction grating includes a substrate (2) and an array of elongate diffracting elements (3) arranged in a grating profile across the substrate. The grating profile imparts a predefined phase change to optical beams to at least partially correct the beams for optical aberrations present in the optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.