Alternating phase shift mask
US10859903B1 · kind B1 · utility
2Cited by
5References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2017 |
| Grant date | Dec 8, 2020 |
| Priority date | — |
| Expiry date | Apr 26, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alternating phase-shifting mask (Alt-PSM) comprising a 0° phase portion having a first width and a 180° phase portion having a second width greater than the first width. Example differences between the width of the 180° phase portion and the 0° phase portion may be 10 nm, 15 nm, or 20 nm. An Alt-PSM having phase portions of different widths can have an aerial image intensity transmission graph that is symmetric, for example, at 0.2-0.3 intensity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.