Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method
US10859921B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2015 |
| Grant date | Dec 8, 2020 |
| Priority date | — |
| Expiry date | Jan 23, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2223/544
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.