System for wiping a photoconductive surface
US10859962B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2017 |
| Grant date | Dec 8, 2020 |
| Priority date | — |
| Expiry date | Feb 14, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G2221/001
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an example, a first wiper blade is to contact the photoconductive surface and to wipe at least some of particles and fluid from the photoconductive surface and wherein a second wiper blade is to contact the photoconductive surface and to wipe at least some of the particles and fluid that have passed the first wiper blade, from the photoconductive surface. The first wiper blade includes at least one perforation forming a passage through the wiper blade to transmit part of the particles and fluid during wiping.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.