Tank for substrate cleaning, tank heating apparatus, tank heating method, and substrate cleaning apparatus
US10864556B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 4, 2017 |
| Grant date | Dec 15, 2020 |
| Priority date | — |
| Expiry date | Sep 22, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P80/10
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A tank for substrate cleaning, a tank heating apparatus, a tank heating method and a substrate cleaning apparatus are provided. The substrate cleaning tank includes a tank body, a hot waste gas recycle tube, a heater and a heat exchange tube. The hot waste gas recycle tube is used to receive a hot waste gas in a hot waste gas discharge tube of a production line, the heater and the heat exchange tube are used to heat a fluid in the tank body, and the heat exchange tube is communicated with the hot waste gas recycle tube. The hot waste gas is effectively utilized, the power consumption is reduced, the production cost is saved, and the discharge of the hot waste gas is reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.