Vapour deposition method for preparing amorphous lithium-containing compounds
US10865480B2 · kind B2 · utility
1Cited by
11References
15Claims
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Key dates
| Filing date | Jan 7, 2015 |
| Grant date | Dec 15, 2020 |
| Priority date | — |
| Expiry date | Jan 7, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vapour deposition method for preparing an amorphous lithium-containing oxide or oxynitride compound not containing phosphorous comprises providing a vapour source of each component element of the compound, including at least a source of lithium, a source of oxygen, a source of nitrogen in the case of an oxynitride compound, and a source or sources of one or more glass-forming elements; heating a substrate to substantially 180° C. or above; and co-depositing the component elements from the vapour sources onto the heated substrate wherein the component elements react on the substrate to form the amorphous compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.