Projection apparatus
US10866500B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2020 |
| Grant date | Dec 15, 2020 |
| Priority date | — |
| Expiry date | Feb 20, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B21/13
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection apparatus includes a plurality of two-fluid nozzles, a projection-apparatus-side-gas-flow-path, a gas valve, a projection-apparatus-side-liquid-flow-path, a liquid valve, a projector, a mist concentration measurer, and a controller. The controller starts and stops spraying of a mist by controlling the gas valve and the liquid valve on the basis of an image or a video projected onto a screen from the projector. The controller receives a signal indicating a mist concentration from the mist concentration measurer, starts and stops spraying of the mist by controlling the gas valve and the liquid valve on the basis of the received signal, and thus controls the mist concentration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.