Composition for limiting the formation and/or agglomeration of gas hydrates
US10870789B2 · kind B2 · utility
4Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 25, 2016 |
| Grant date | Dec 22, 2020 |
| Priority date | — |
| Expiry date | May 19, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K2208/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Provided is a composition that includes (i) at least one compound represented by formula (I) as defined herein or a salt thereof and (ii) a nonionic surfactant. The composition is useful for limiting or preventing the formation and/or agglomeration of gas hydrates, by combining the composition and a production fluid that includes an aqueous phase and one or more gases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.