Injection apparatus and injection method for liquid sample for standard gas production
US10871429B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 13, 2018 |
| Grant date | Dec 22, 2020 |
| Priority date | — |
| Expiry date | Jul 13, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2001/387
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The purpose of the present invention is to provide an injection apparatus and an injection method for a liquid sample for standard gas production, wherein the injection apparatus for injecting a liquid sample present in a liquid state at room temperature into a standard gas container has an improved structure that minimizes the area in which the liquid sample directly contacts the injection apparatus so as to prevent the problem in which the liquid sample is adsorbed into the injection apparatus. Furthermore, another purpose of the present invention is to provide an injection apparatus and an injection method for a liquid sample for standard gas production, in which a step of volatilizing the remaining liquid sample by heating is eliminated during the injection of the liquid sample, thereby preventing the apparatus from being damaged by heating to thereby improve the durability of the apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.