Thermal chemical vapor deposition coating
US10876206B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 31, 2016 |
| Grant date | Dec 29, 2020 |
| Priority date | — |
| Expiry date | Aug 31, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/045
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.