Pattern projection device
US10876707B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 16, 2019 |
| Grant date | Dec 29, 2020 |
| Priority date | — |
| Expiry date | Mar 11, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B3/0056
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A pattern projection device includes a matric-type light source, an image lens and a lampshade. The matric-type light source is composed of a plurality of light-emitting elements for emitting image light with a pattern. The image lens is located downstream of optical path of the matric-type light source, and the image lens includes a lens with refractive power and an anamorphic optical element. The lampshade is located downstream of the optical path of the anamorphic optical element. The anamorphic optical element is selected from the group consisting of a cylindrical lens, a biconic lens, a lenticular lens, a wedge lens, a wedge plate or a combination thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.