Patent · US Active

Apparatus and method for analyzing a material

US10876965B2 · kind B2 · utility

0Cited by

21References

17Claims

0Family size

Assignee

DiaMon Tech AG · DE

Inventors

Alexander Bauer · Rosenheim, DE
Otto Hertzberg · Frankfurt am Main, DE
Thorsten Lubinski · Berlin, DE

Key dates

Filing date	Dec 9, 2015
Grant date	Dec 29, 2020
Priority date	—
Expiry date	Jan 5, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG01N2201/06113
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The invention relates, inter alia, to an apparatus (10) for analyzing a material (101), comprising an excitation emission device (100) for generating at least one electromagnetic excitation beam (SA), in particular an exciting light beam, having at least one excitation wavelength, further comprising a detection device (106) for detecting a reaction signal (SR), and a device (107) for analyzing the material on the basis of the detected reaction signal (SR).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.