Patent · US Active

Fluid application devices with resistive coatings

US10877425B2 · kind B2 · utility

0Cited by

8References

14Claims

0Family size

Assignee

HP INDIGO B.V. · NL

Inventors

Guang Jin Li · San Diego, US
Daniel Tanchangco · San Marcos, US
Eyal Negreanu · Nes Ziona, IL

Key dates

Filing date	Jun 27, 2017
Grant date	Dec 29, 2020
Priority date	—
Expiry date	Jun 27, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03G15/0818
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In one example in accordance with the present disclosure, a fluid application device is described. The device includes an application roller to deposit a fluid containing metallic particles on a surface. A squeegee roller of the device forms a first nip with the roller and a cleaner roller forms a second nip with the application roller. A first resistive coating is disposed on a surface of the application roller.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.