Display substrate, manufacturing method therefor, and display device
US10879278B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 5, 2018 |
| Grant date | Dec 29, 2020 |
| Priority date | — |
| Expiry date | Jun 1, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A display substrate, a manufacturing method thereof, and a display device are provided. The manufacturing method of the display substrate includes: forming a pattern of first transparent conductive layer, forming a passivation layer and forming a second transparent conductive layer on the passivation layer, forming a pattern of second transparent conductive layer, i.e., a slit electrode, the pattern of second transparent conductive layer including a plurality of sub-electrodes arranged at intervals and located in a display region of the display substrate; and removing a portion of the passivation layer which is in the display region and is not covered by the sub-electrodes, forming a pattern of passivation layer. The second transparent conductive layer is polycrystalline ITO.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.