Regeneration of etch solutions containing trivalent manganese in acid media
US10882756B2 · kind B2 · utility
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Key dates
| Filing date | Feb 25, 2020 |
| Grant date | Jan 5, 2021 |
| Priority date | — |
| Expiry date | Feb 25, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/381
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method of regenerating an etch solution comprising a metastable complex of manganese(III) ions in a strong acid is described in which at least a portion of the manganese(III) ions in the metastable complex have been destabilized, causing them to disproportionate into manganese dioxide and manganese(II) ions. The method includes the steps of i) adding an effective amount of a reducing agent to the solution; ii) allowing the reducing agent to react with the solution to cause manganese dioxide to dissolve; and (iii) applying an electrical current to regenerate manganese(III) ions in the solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.