Apparatus and method for dewetting-based spatial light modulation for high-power lasers
US10884253B2 · kind B2 · utility
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3References
20Claims
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Key dates
| Filing date | Jul 31, 2018 |
| Grant date | Jan 5, 2021 |
| Priority date | — |
| Expiry date | Jan 12, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/0085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method for dynamic and reversible patterning of mask layers and manipulation and redistribution of energy sources such as laser beams. An embodiment of the present invention provides an apparatus including a mirror-like thin film comprising a front surface and a back surface configured to reflect a laser beam; a layer of a mask material on top of the front surface of the mirror-like thin film, wherein the mask material is transparent to the laser beam and is dewetted by a heat source to create a height profile in the mask material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.