Patent · US Active

System and method for micro-nano machining by femtosecond laser two-photon polymerization

US10884343B2 · kind B2 · utility

1Cited by

2References

9Claims

0Family size

Assignee

Southern University of Science and Technology · CN

Inventors

Xing Cheng · College Station, US
Dehu Cui · Tangxia, CN
Ziping Li · 流花街道, CN
Jing Ming · Chongqing, CN

Key dates

Filing date	Oct 22, 2014
Grant date	Jan 5, 2021
Priority date	—
Expiry date	Dec 28, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70641
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Disclosed are a system and method for micro-nano machining by femtosecond laser two-photon polymerization. The system includes: a femtosecond laser, an external light path modulation unit, an image capture apparatus, a focusing lens, a displacement platform, a computer and a monitoring apparatus, where the image capture apparatus is configured to capture cross-section graphs of a three-dimensional micro-nano device layer by layer, so that modulated femtosecond lasers form parallel beams arranged according to all layers of the cross-section graphs.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.