Impedance matching method, impedance matching device and plasma generating apparatus
US10886105B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 21, 2018 |
| Grant date | Jan 5, 2021 |
| Priority date | — |
| Expiry date | May 21, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present disclosure provides an impedance matching method, an impedance matching device and a plasma generating device. The impedance matching method is implemented for matching an impedance of a load connected to an RF source to an impedance of the RF source, including: selectively performing an automatic matching step or a frequency scan matching step according to an operation mode of the RF source, wherein: in the automatic matching step, instructing a motor to drive an impedance matching network to provide a certain impedance; and in the frequency scan matching step, instructing the motor to stop driving and the RF source to perform a frequency scanning operation. According to the embodiments of the present disclosure, a phenomenon of unstable and non-repetitive matching caused by fast impedance changing during the impedance matching process can be effectively avoided, and a large processing window and process stability can be implemented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.