Patent · US Active

Grouped nanostructured units system forming a metamaterial

US10886422B2 · kind B2 · utility

1Cited by
4References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 13, 2014
Grant dateJan 5, 2021
Priority date
Expiry dateAug 14, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

This invention concerns a grouped nanostructured unit system forming a metamaterial within the silicon and the manufacturing process to arrange them therein in an optimal manner. The nanostructured units are grouped and conditioned in an optimal arrangement inside the silicon material. The process comprises the modification of the elementary crystal unit together with the stress field, the electric field and a heavy impurity doping in order to form a superlattice of nanostructured units grouped in an optimal arrangement so as to improve the efficiency of the light-to-electricity conversion by means of efficient use of the kinetic energy of hot electrons and efficient collection of all electrons generated within the converter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.