Active gas-generating device and film formation apparatus
US10889896B2 · kind B2 · utility
3Cited by
0References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2016 |
| Grant date | Jan 12, 2021 |
| Priority date | — |
| Expiry date | Nov 29, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3323
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
With respect to a dielectric electrode, gas-jetting holes and gas-jetting holes formed in two rows along the X direction are provided as three or more gas-jetting holes along the X direction in a central region. By providing a difference in the X direction between the position where the gas-jetting hole is formed and the position where the gas-jetting hole is formed, the gas-jetting holes and the gas-jetting holes disposed in two rows are provided such that gas-jetting holes and gas-jetting holes are alternately disposed along the X direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.