Mask and manufacturing method thereof as well as display device
US10890789B2 · kind B2 · utility
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13Claims
0Family size
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Key dates
| Filing date | Sep 30, 2017 |
| Grant date | Jan 12, 2021 |
| Priority date | — |
| Expiry date | Sep 10, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13398
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure relates to a mask and a manufacturing method thereof as well as a display device, the mask includes a transmittable substrate and a mask pattern formed on the transmittable substrate, wherein a transmittance of the transmittable substrate decreases gradually from the edge to the center.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.