Material for detecting photoresist and method of fabricating semiconductor device using the same
US10890848B2 · kind B2 · utility
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2References
13Claims
0Family size
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Key dates
| Filing date | Jul 17, 2018 |
| Grant date | Jan 12, 2021 |
| Priority date | — |
| Expiry date | Feb 17, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/6439
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided are a material for detecting photoresist and a method for detecting photoresist using the same. The material for detecting photoresist may include a macrocyclic molecule having a hollow structure and a fluorescent substance which is labeled on the macrocyclic molecule, and the macrocyclic molecule is at least one of cyclodexrin, cucurbituril, calixarene, pillararene and catenane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.