ICP antenna and substrate processing device including the same
US10892139B2 · kind B2 · utility
0Cited by
1References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 5, 2017 |
| Grant date | Jan 12, 2021 |
| Priority date | — |
| Expiry date | Dec 5, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H7/38
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided is an ICP antenna used in a plasma processing device. The ICP antenna includes an antenna coil having one end connected to an RF power source through an impedance matching circuit and the other end that is grounded; and a variable capacitor connected in parallel to a portion of the antenna coil.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.