Removal of inorganic coatings from glass substrates
US10894739B2 · kind B2 · utility
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22References
29Claims
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Key dates
| Filing date | Nov 21, 2016 |
| Grant date | Jan 19, 2021 |
| Priority date | — |
| Expiry date | Dec 11, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K13/08
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Methods of etching an inorganic layer on a glass substrate are described, the methods comprising contacting the glass substrate including an inorganic layer with an etching solution comprising a polar organic solvent and an etchant, wherein the inorganic layer is removed at an inorganic layer etching rate and the glass substrate is etched as a glass etching rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.