Antireflection film
US10895667B2 · kind B2 · utility
3Cited by
14References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2017 |
| Grant date | Jan 19, 2021 |
| Priority date | — |
| Expiry date | May 18, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D7/61
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm from the surface and exhibiting one extremum at a thickness of 85 nm to 105 nm from the surface in a graph showing the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu—K-alpha rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.