Planarization of optical substrates

US10901121B2 · kind B2 · utility

Assignees

• Lawrence Livermore National Security, LLC · US
• COLORADO STATE UNIVERSITY RESEARCH FOUNDATION · US

Inventors

• Christopher J. Stolz · Lathrop, US
• James A. Folta · Livermore, US
• Paul B. Mirkarimi · Sunol, US
• Regina Soufli · Berkeley, US
• Christopher C. Walton · Berkeley, US
• Justin Wolfe · Lawrenceville, US
• Carmen S. Menoni · Fort Collins, US
• Dinesh R. Patel · Sugar Land, US

Key dates

• Filing date: Nov 7, 2018
• Grant date: Jan 26, 2021
• Expiry date: Jan 6, 2039

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C2218/33
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method of making a laser mirror in which a mirror substrate has at least a one micron size nodular defect includes depositing a planarization layer over the mirror substrate and the nodular defect, depositing a layer of silicon dioxide over the planarization layer, and etching away a portion of the layer of silicon dioxide. The method also includes thereafter, depositing a layer of hafnium dioxide over the layer of silicon dioxide and repeating the steps of depositing a layer of silicon dioxide, etching away a portion of the layer of silicon dioxide, and depositing a layer of hafnium dioxide until the nodular defect is reduced in size a predetermined amount.