Wear levelling in non-volatile memories
US10901884B2 · kind B2 · utility
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19Claims
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Inventors
Key dates
| Filing date | Dec 2, 2016 |
| Grant date | Jan 26, 2021 |
| Priority date | — |
| Expiry date | Dec 2, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C2029/0409
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Broadly speaking, embodiments of the present technique provide an apparatus and methods for improved wear-levelling in non-volatile memory (NVM) devices. In particular, the present wear-levelling techniques operate on small blocks within a memory device, at a finer scale/granularity than that used by common wear-levelling techniques which often remap large blocks (e.g. several kilobytes) of data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.