Local control loop for projection system focus adjustment
US10908383B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 5, 2018 |
| Grant date | Feb 2, 2021 |
| Priority date | — |
| Expiry date | Jul 25, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N13/254
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Optoelectronic apparatus includes a projector, which includes an array of first emitters, which emit respective first beams of optical radiation at a first wavelength, and a second emitter, which emits a second beam of optical radiation at a second wavelength. Projection optics receive the first and second beams of the optical radiation through an entrance face and project the beams through the exit face. An optical window transmits the radiation at the first wavelength and reflects the radiation at the second wavelength, and is positioned adjacent to the exit face of the projection optics so as to reflect the second beam back through the projection optics toward an optical sensor positioned in proximity to the first and second emitters. A controller drives an actuator to adjust a focal setting of the projection optics responsively to a distribution of the optical radiation received and sensed by the optical sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.