Resist composition, method of forming resist pattern, polymeric compound, and compound
US10908502B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 1, 2018 |
| Grant date | Feb 2, 2021 |
| Priority date | — |
| Expiry date | Apr 24, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2800/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Ra01 represents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Ra01 is an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Ra02 is a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Ra01 is bonded; and when Ra01 is an alkyl group, Ra02 is a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.