Patent · US Active

Method for manufacturing a low-profile intercranial device and the low-profile intercranial device manufactured thereby

US10912648B2 · kind B2 · utility

3Cited by
89References
28Claims
0Family size

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Key dates

Filing dateAug 4, 2017
Grant dateFeb 9, 2021
Priority date
Expiry dateMar 3, 2039

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61N1/37518
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

A low-profile intercranial device including a low-profile static cranial implant and a functional neurosurgical implant. The low-profile static cranial implant and the functional neurosurgical implant are virtually designed and interdigitated prior to physical assembly of the low-profile intercranial device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.