Method for manufacturing a low-profile intercranial device and the low-profile intercranial device manufactured thereby
US10912648B2 · kind B2 · utility
3Cited by
89References
28Claims
0Family size
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Key dates
| Filing date | Aug 4, 2017 |
| Grant date | Feb 9, 2021 |
| Priority date | — |
| Expiry date | Mar 3, 2039 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N1/37518
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A low-profile intercranial device including a low-profile static cranial implant and a functional neurosurgical implant. The low-profile static cranial implant and the functional neurosurgical implant are virtually designed and interdigitated prior to physical assembly of the low-profile intercranial device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.