Photosensitive resin composition, photosensitive resin layer using same and color filter
US10915020B2 · kind B2 · utility
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14Claims
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Key dates
| Filing date | Nov 28, 2017 |
| Grant date | Feb 9, 2021 |
| Priority date | — |
| Expiry date | Apr 14, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/105
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer.(In Chemical Formula 1, each substituent is the same as defined in the specification.)
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.