Ion beam focus adjustment
US10916414B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2019 |
| Grant date | Feb 9, 2021 |
| Priority date | — |
| Expiry date | Jan 25, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/142
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The disclosure features systems and methods that include: exposing a biological sample to an ion beam that is incident on the sample at a first angle to a plane of the sample by translating a position of the ion beam on the sample in a first direction relative to a projection of a direction of incidence of the ion beam on the sample; after each translation of the ion beam in the first direction, adjusting a focal length of an ion source that generates the ion beam; and measuring and analyzing secondary ions generated from the sample by the ion beam after adjustment of the focal length to determine mass spectral information for the sample, where the sample is labeled with one or more mass tags and the mass spectral information includes populations of the mass tags at locations of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.