Apparatus of reactive cathodic arc evaporator for plating lithium-compound thin film and method thereof
US10916800B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 7, 2019 |
| Grant date | Feb 9, 2021 |
| Priority date | — |
| Expiry date | Mar 9, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus is provided for plating a lithium (Li)-compound thin film. In the thin film, Li is obtained through thermal evaporation, and titanium (Ti) or other metal by using arc plasma. The elements converted into gas phase are co-deposited in a plasma environment with a reaction gas (oxygen) to be activated as excited atoms or molecules for reaction. In the end, all of the constituent elements are deposited on a substrate to form the Li-compound thin film. Thus, reaction efficiency is high with a fast deposition rate. The composition ratio of each element is independently determined to control its yield according to the requirement. Hence, the present invention greatly enhances the fabrication rate with lowered production cost for applications in the thin-film battery industries.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.